Stimulation/Production Chemicals

Liquid surfactant which creates acid-in-solvent emulsion which retards acid reaction rate. The resultant emulsion provides simultaneous organic solvent/acid contact on the scale or formations being treated. OILAID-AR-15 provides a variety of solvents and acids with solvent concentrations ranging from 10% to 50%. The acids may be hydrochloric, mud-acid, or inorganic acids, and the solvents can be toluene, xylene, or aromatic solvent. The solvents remove asphaltenes, oil, or paraffin from the scale or target formations, while the acids remove the acid soluble material. The dispersion is easily mixed and is stable over a wide temperature range from 40°F to 100°F. Typical loading for OILAID-AR-15 is 15 gal/1000 gal acid, although laboratory pilot testing is recommended prior to use in the field.        

Highly effective anionic surfactant, filming agent for slowing the reaction rate on carbonate formations. OILAID-AR-652 is effective to temperatures up to 300°F. The surfactant functions by forming a film over the formation face. Typically used in 15% and 30% HCl systems.                                                                                                      

Product Data Sheet          

Liquid surfactant which creates solvent-in-acid emulsion which retards acid reaction rate. The resultant emulsion provides simultaneous organic solvent/acid contact on the scale or formations being treated. OILAID-AD-15 provides a variety of solvents and acids with solvent concentrations ranging from 10% to 50%. The acids may be hydrochloric, mud-acid, or inorganic acids, and the solvents can be toluene, xylene, or aromatic solvent. The solvents remove asphaltenes, oil, or paraffin from the scale or target formations, while the acids remove the acid soluble material. The dispersion is easily mixed and is stable over a wide temperature range from 40°F to 100°F. Typical loading for OILAID-AD-15 is 15 gal/1000 gal acid, although laboratory pilot testing is recommended prior to use in the field.